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Properties of thin film amorphous
silicon with nanocrystalline inclusions
Charlie Blackwell (Physics),
advisor: Jim Kakalios, co-advisor: Uwe Kortshagen (ME)
Amorphous silicon is
used today in many device applications such as solar panels and LCD displays.
Recently, many different types of silicon have been classified, such as
polymorphous, protocrystalline, microcrystalline, and hydrogenated nanostructured
silicon, among others. The type of silicon produced depends upon the growth
conditions, which in turn affects the electrical and optical properties
of the material. In our lab, we investigate the different properties of
thin film amorphous silicon with nanocrystalline inclusions. These films
are grown under a variety of conditions, producing never-before-seen films.
Measurements performed on samples include Fourier Transform Infrared (FTIR)
Spectroscopy, noise power of conductance fluctuation, thermopower, and the
constant photocurrent method. In addition to studying thin films, we will
study the 1/f noise of nanoparticles themselves.
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